DEWYTREE

AC CTRL EX Deep Repair Blemish Mask

For post-breakout deep repair and recovery

The Post-Breakout Recovery Specialist

While many acne masks focus only on drying out spots, DEWYTREE AC CTRL EX Deep Repair Blemish Mask prioritizes healing the skin afterward. It uses a specialized complex to soothe active irritation while preventing the lingering marks often left behind by blemishes.

Why it’s a Real Gem: It is a "Popular, but Proven" choice in Korea for its high-performance essence that repairs the moisture barrier even as it treats inflammation.

Best For: Those dealing with hormonal acne or persistent blemishes who need to heal their skin without causing dryness.

Key Ingredients
Green Lime C Complex Helps visibly reduce the appearance of dark spots using a blend of potent brightening agents. Lime Fruit Extract (Citrus Aurantifolia) & Glutathione Work together to help lighten the look of skin pigmentation and improve overall tone clarity. Vitamin C Derivative Targets the appearance of dark spots and acne marks for a more even-looking complexion. Cica Mint™ (Patented Complex) Dewytree’s proprietary soothing complex that helps calm, hydrate, and comfort the skin. Centella Asiatica Extract Obtained through a 100-hour low-temperature elution process to enhance soothing efficacy and support sensitive skin.
How to Use
After cleansing, use toner (optional but helps the mask sit smoothly). Apply the mask and smooth to fit. Leave on for 10–20 minutes, then remove and pat in remaining essence. When: PM, 2–4x a week. Actives tip: Use as a calming or recovery step instead of layering more actives.
Full Ingredients

Water,Butylene Glycol,Propanediol,1,2-Hexanediol,Niacinamide,Hydroxyethyl Urea,Methyl Gluceth-20,Glycereth-26,Acrylates/C10-30 Alkyl Acrylate Crosspolymer,Polyglyceryl-10 Laurate,Arginine,Allantoin,Glycerin,Ethylhexylglycerin,Sodium Polyacrylate,Polyglyceryl-10 Myristate,Disodium EDTA,Sodium Hyaluronate,Betula Platyphylla Japonica Juice,Dipotassium Glycyrrhizate,Rosmarinus Officinalis (Rosemary) Leaf Oil,Mentha Piperita (Peppermint) Leaf Extract,Mentha Piperita (Peppermint) Oil,Caprylic/Capric Triglyceride,Ascorbyl Glucoside,Glutathione,Centella Asiatica Extract,Ceramide NP,Hydrogenated Lecithin,Camellia Japonica Seed Oil,Papain,Polyglutamic Acid,Linoleic Acid,Citrus Aurantifolia (Lime) Fruit Extract,Tocopherol,

AC CTRL EX Deep Repair Blemish Mask
$24.00
Taxes & duties included.
Quantity
Free worldwide shipping over $60. Ships from Seoul in 3–4 business days.